Analysis of powder and dispersion. Development of formulations and pigment testing
Particle Measuring Technology
The distribution of particle size and form has a large influence on product properties, quality and process, transport and storage_cc781905-95cde-31-95cde-3b -136bad5cf58d_behavior.
For characterization, different measuring techniques are available. We measure Particle Size Distributions down to sub-100nm field.
Static Laser Diffraction (ISO 13320)
Laser light which is scattered at particles is detected at different angles.
The detected pattern of diffracted and scattered light is calculated in mass based particle size distributions.
Measuring Range: 40nm to 2000µm
Sample preparation: Dry or wet
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Optimal application area for particles between 50nm and 1000 microns.
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Universal application for pure substances and powder mixtures.
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Results are volume based particle size distributions.
PSDA by laser diffraction
Dynamic Light Scattering DLS (ISO 13321)
Derivation particle size from diffusion speed of particles in dispersion. Dispersion is radiated with laser light and scattered light is detected at large angles (90° and 180°). the diffusion speed of particles is correlating with the fluctuation of signals, whereby small particles generates a fast signal fluctuation. The result is the intensity distribution.
Measuring Range: 0.5nm to 10µm
Sample preparation: Wet and highly diluted
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Optimal application area for particles <1000nm.
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Elaborate sample preparation (dilution, filtration, stabilization of particles)
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Measurement depends on viscosity and temperature.
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Overlay of weak signals from nanoparticles through intensive signals of large particles. That means analysis of nanoparticles in attendance of coarse shares are not possible.
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Results are intensity based particle size distributions.
Particle Counting Impedance measurement (ISO 13319)
A method based on the principle of impedance measurement. Change of resistant while particles pass measuring zone is proportional to the volume of particles.
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Measuring range: 0.2 µm to 1600 µm
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Sample preparation: Wet
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Detention of "Overgrain size" possible
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Method is suitable for measurements of very narrow particle size distributions
Micro- und Nanoanalysis _cc781905- 5cde-3194-bb3b-136bad5cf58d_ _cc781905-5cde-3194-bb3b -136bad5cf58d_ _cc781905-5cde -3194-bb3b-136bad5cf58d_ _cc781905-5cde-3194-bb3b- 136bad5cf58d_ _c c781905-5cde-3194-bb3b-136bad5cf58d_ _cc781905-5cde-3194 -bb3b-136bad5cf58d_ _cc781905 -5cde-3194-bb3b-136bad5cf58d_ _cc781905-5cde-3194- bb3b-136bad5cf58d_ _cc781905- 5cde-3194-bb3b-136bad5cf58d_
Methods for surface analysis are X-Ray Photo Electron Spectroscopy XPS and Scanning Electronmicroscopie SEM. They are usable for analyzing the chemical composition and bonding states. Additional the recording of deep profile are possible. The methods are working on micro, sub 100 nanometer, and nanometer scales.
X-Ray Photoelectron Spectroscopy XPS
Using XPS the chemical composition of the surface of powder is analyzed. Result is the distribution of chemicals substances. With Ar-sputtering technique the surface of solids can be removed. So the change of concentration dependent of the profile deep can be measured.
Chemical composition, chemical structure and binding states in micron scale can be investigated.
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Chemical 2D card of a XPS surface analysis
Chemical Analysis
ICP-OES element screening
Digestion of your powder sample according DIN EN 13656 and semiquantitative overview analysis_cc781905-5cde -3194-bb3b-136bad5cf58d_using ICP-OES according DIN EN ISO 11885._d04a07d8-9cd1-3239- 9149-20813d6c673b_
Analysis result is a semiquantitative element screening of 69 elements.
RFA Analysis
Solid state overview analysis according to DIN EN 15309
Analysis result is a semiquantitative element screening (metals)
