Analysis of powder and dispersion. Development of formulations and pigment testing

Static laser diffraction (ISO 13320)

The laser light scattered by the particles is detected at different angles.

The recorded diffraction and scattered light patterns are converted into mass-based particle size distributions using mathematical algorithms.

 

Measuring range: 40nm to 2000µm

Sample preparation: dry measurement and/or wet measurement

 

• Optimum application range for particles from 100nm to 100µm

• Universally applicable method for powder mixtures and pure substances

•  Simple Sample preparation as suspension and powder  

• Pure substances with known optical properties down to Particle sizes of 40nm measurable.

• Dispersions can be measured from a solids concentration of around 0.5% by volume

• Output of volume-distributed particle size distributions.

 

Dynamic Light Scattering DLS (ISO 13321)

Derivation of the particle size from the diffusion speed with which the particles move in a suspension or emulsion. The suspension is irradiated with laser light and the scattered light is detected at large angles (90° and 180°). The speed of movement of the particles correlates with the fluctuation of the signal, with small particles producing a rapid signal fluctuation. The result is an intensity distribution.

 

Measuring range: 0.5nm to 10µm

Sample preparation: wet measurement

 

• Optimum application range for particles <100nm

• Elaborate sample preparation (dilution, filtration, stabilization of the particles)

• Measurement depends on viscosity and temperature

• Superimposition of the weaker nanoparticle signals by strong signals from coarse particle contamination. Ie nanoparticle analysis not possible in the presence of coarse particles.

• Output of intensity-distributed particle size distributions

Particle counting impedance measurement method (ISO 13319)

A particle counting method based on the principle of the impedance measurement method. The change in resistance when the particles pass through the measuring zone is proportional to the particle volume.

 

• Measuring range: 0.2 µm to 1600 µm  

• Sample preparation: wet measurement

• Detection of "oversize"

• Suitable method for measuring very narrow particle size distributions

• Numerous capillaries are available for a wide measuring range.

Mikro- und Nanoanalyse           _cc781905 -5cde-3194-bb3b-136bad5cf58d_         _cc781905-5cde-3194- bb3b-136bad5cf58d_           _cc781905- 5cde-3194-bb3b-136bad5cf58d_         _cc781905-5cde-3194-bb3b -136bad5cf58d_       _c c781905-5cde-3194-bb3b-136bad5cf58d_         _cc781905-5cde-3194 -bb3b-136bad5cf58d_           _cc781905 -5cde-3194-bb3b-136bad5cf58d_         _cc781905-5cde-3194- bb3b-136bad5cf58d_           _cc781905- 5cde-3194-bb3b-136bad5cf58d_      

The TOF-SIMS, Microfocus XPS and Auger scanning electron microscopy methods used for surface analysis are suitable for analyzing the chemical composition, structure and bonding states of inorganic and organic materials. In addition, the recording of chemical 2-dimensional maps and the recording of depth profiles are possible. The methods are complementary to each other as they work on the micro, sub 100 nanometer and nanometer scales. 

Microfocus X-ray photoelectron spectrometer XPS

With microfocus XPS the local chemical composition of the surface of a sample (eg chemical map of nanoparticles) is determined. Different elements can be distinguished and the binding states can be described. The results are 2-dimensional intensity profiles that reflect the local distribution of chemical compounds. The surface can be removed by sputtering with Ar ions. Oxide layers are removed and a pure, unoxidized layer remains. A change in the concentration of elements with increasing layer depth can be measured in this way.

 

Chemical composition, chemical structure and bonding states in the micron range.

 

• Analysis of inorganic and organic materials.

• Identification of binding and oxidation states.

• 2D mapping

• Creation of depth profiles

• Numerous sample systems (metals and alloys, polymers, ceramics)

 

Sensitivity:           _cc781905-5cde-3194-bb3b-131cf5d5b-1 %1 atom

Information depth:     1nm to 10nm

Lateral resolution:  < 10µm

Depth profiling:    Up to 1nm vertical   resolution

Chemical Analysis

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ICP-OES element screening

Druckaufschluss der Pulverprobe nach DIN EN 13656 und semiquantitative Übersichtsanalyse _cc781905-5cde-3194 -bb3b-136bad5cf58d_by means of ICP-OES according to DIN EN ISO DIN EN 11885.

The result of the analysis is you get a s​​emiquantitative Solid Analysis Element screening of 69 elements.

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RFA analysis

solid Overview analysis based on DIN EN 15309.

You will receive a semi-quantitative element screening (metals) as the analysis result.

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