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Anker Partikelmesstechnik
Particle Measuring Technology
The distribution of particle size and form has a large influence on product properties, quality and process, transport and storage behavior.   
For characterization, different measuring techniques are available. We measure Particle Size Distributions down to sub-100nm-field.  

Static Laser Diffraction (ISO 13320)

Laserlight which is scattered at particles is detected at different angles.

The detected pattern of diffracted and scattered light is calculated in mass based particle size distributions.

Measuring Range: 40nm bis 2000µm

Sample preparation: Dry or wet


  • Optimal application area for particles between 50nm and 1000 micron.

  • Universal application for pure substances and powder mixtures.

  • Results are volume based particle-size-distributions.


PSDA by Laserdiffraction

Dynamic Light Scattering DLS (ISO 13321)

Derivation particle size from diffusion speed of particles in dispersion. Dispersion is radiated with laserlight and scattered light is detected at large angles (90° und 180°). the diffusions speed  of particles is correlating with the fluctuation of  signals, whereby  small particles generates a fast signal fluctuation. Result is the intensity distribution.  


Measuring Range: 0,5nm bis 10µm

Sample preparation: Wet and high diluted


  • Optimal application area for particles <1000nm.

  • Elaborate sample preparation (dilution, filtration, stabilisation of particles)

  • Measurement depends on viscosity and temperature.

  • Overlay of weak signals from nanoparticles through intensive signals of large particles. That means analysis of nanoparticles in attendance of coarse shares are not possible.

  • Results are intensy based particle-size-distributions.

Particle Counting Impedance measurement (ISO 13319)

A method based on principle of Impedance measurement. Change of resistant while particles pass measuring zone is proportional to the volume of particles. 


  • Measuring Range: 0,2µm bis 1600µm  

  • Sample preparation: Wet

  • Detention of  "Overgrain size" possible

  • Method is suitable for measurements of very narrow particle size distributions

Anker Mikroanalyse

Micro- und Nanoanalysis                                                                                                      

Methods for surface analysis are X-Ray Photo Electron Spectroscopy XPS and Scanning Electronmicroscopie SEM. They are usable for analyzing the chemical composition and bonding states. Additional the recording of deep profile are possible. The methods are working on mircon-, sub-100-nanometer-, und nanometer scales. 

X-Ray- Photoelektron-Spectroskopy XPS

Using XPS the chemical composition of the surface of powder is analyzed. Bonding states and oxidation states can be analyzed. Result is the distribution of chemicals substances.  With Ar-sputtering technique the surface of solids can be removed. So the change of concentration dependent of the profile deep can be measured.


Chemical composition, chemical structure and binding states in micron scale can be investigated.


Chemical 2D card of a XPS surface analysis

Anker RFA

Chemical Analysis

ICP-OES Elementscreening

Digestion of your powder sample according DIN EN 13656 and semiquantitative overview analysis using ICP-OES according DIN EN ISO 11885.​​


Analysis result is a semiquantitative element screening of 69 elements.

RFA Analysis

Solid state overview analysis according DIN EN 15309

Analysis result is a semiquantitative element screening (metals)

Analyse Pulver und Dispersion
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